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Plasma Etching: Fundamentals and Applications (Series on Semiconductor Science and Technology)
$344.76 USD
$256.49 USD
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ISBN: 019856287X
Author: Sugawara, M.
Condition: New
This book focuses on the remarkable recent advances in understanding low pressure radio frequency glow discharges. It explains the basic analytical theory, plasma physics, and plasma diagnostics, before proceeding to the details of the etching process.
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Plasma Etching: Fundamentals and Applications (Series on Semiconductor Science and Technology)
$344.76 USD
$256.49 USD